Equipment for Deposition of High-temperature Superconducting Films by MOCVD Technology

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  • J. Stejskal Department of Inorganic Chemistry, Institute of Chemical Technology, Prague

Abstrakt

An apparatus for deposition of 31igh-temperature superconducting thin films in the Y-Ba-Cu-O, Bi-Sr-Ca-Cu-O and Ti-Ba-Ca-Cu-O systems by metal-organic chemical vapour deposition (MOCVD) is presented. The reliability of the apparatus was verified by deposition and characterization of the CuO, Cu-Sr-O and Bi-Sr-Ca-Cu-O thin films. The apparatus will be used for preparation and study of Y-, Bi- and Tl-based oxide superconductor thin films.

Stahování

Publikováno

15.02.1999

Jak citovat

Stejskal, J. (1999). Equipment for Deposition of High-temperature Superconducting Films by MOCVD Technology. Chemické Listy, 93(1). Získáno z http://chemicke-listy.cz/ojs3/index.php/chemicke-listy/article/view/2643

Číslo

Vol 93 No 1 (1999)

Sekce

Články